S.E. Beck, M.A. George, D.A. Bohling, E.A. Robertson III, D.A. Moniot, A.J. Kobar, and J.L. Waskiewicz, "Vapor Phase Cleaning with b-Diketones," in 1998 Proceedings - Institute of Environmental Sciences and Technology, (The Institute of Environmental Sciences and Technology, Mount Prospect, IL, 1998).p. 80.

S.E. Beck, E.A. Robertson III, M.A. George, D.A. Moniot, J.L. Waskiewicz, D.A. Bohling, K.M. Young, and A.A. Badowski, "Vapor Phase Cleaning of Cu, Fe, and Na from Wafer Surfaces using 1,1,1,5,5,5-Hexafluor-2,4-Pentanedione," in Cleaning Technology in Semiconductor Device Manufacturing V, edited by J. Ruzyllo and R.E. Novak, (Electrochemical Society Proceedings, vol. 97-35, 1998) p. 336.

M.A. George, S.E. Beck, D.A Moniot, K.M. Young, D.A. Bohling, and D.W. Hess, "The Chemistry of Chemical Vapor Cleaning of Fe with the Chelating Ligand 1,1,1,5,5,5-Hexafluor-2,4-Pentanedione (H+hfac)," in Structure and Evolution of Surfaces, edited by R.C. Cammarata, E.H. Chason, T.L. Einstein, and E.D. Williams, (Mater. Res. Soc. Proc., vol. 440, Pittsburgh, PA, 1997) p. 443.

A.G. Gilicinski, S.E. Beck, R.M. Rynders, and D.A. Moniot, "AFM Methodology for the Measurement of Silicon Wafer Microroughness," in Structure and Evolution of Surfaces, edited by R.C. Cammarata, E.H. Chason, T.L. Einstein, and E.D. Williams, (Mater. Res. Soc. Proc., vol. 440, Pittsburgh, PA, 1997) p. 83.

S.E. Beck, M.A. George, D.A. Bohling, D.A. Moniot, K.M. Young, A.A. Badowski, and E.A. Robertson, "Chemical Vapor Cleaning of Si and SiO2 Surfaces," in 1996 Proceedings of the Advanced Semiconductor Manufacturing Conference and Workshop, (IEEE/SEMI, New York, NY, 1996) p. 175.

S.E. Beck, M.A. George, D.A. Bohling, D.A. Moniot, K.M. Young, and A.A. Badowski, "Chemical Vapor Cleaning of Transition Metals From Wafer Surfaces, in Proceedings of the Third International Symposium on Ultra Clean Processing of Silicon Surfaces, UCPSS ‘96, edited by M. Heyns, M. Merius, and P. Mertens, (ACCO, Leuven, 1996) p. 257.

PRESENTATIONS
D.A. Moniot, "Chemical Vapor Cleaning of Metals from Silicon Wafers," Air Products and Chemicals Fifth Annual Technician's Symposium, Allentown, PA, Sept 1997.

S.E. Beck, M.A. George, D.A. Bohling, D.A. Moniot, E.A. Robertson, A.A. Badowski, and J.L. Waskiewicz, "A Vapor Phase Clean for Wafer Surfaces," AVS Workshop on Contamination - Its Measurement and Control in Vacuum Systems, Newport News, VA, March 1997.

E.A. Robertson, S.E. Beck, M.A. George, D.A. Moniot, and D.A. Bohling, "Chemical Vapor Cleaning of Iron and Copper from Silicon Wafer Surfaces," American Vacuum Society 43rd National Symposium, Philadelphia, PA, October 1996.

S.E. Beck, M.A. George, D.A. Bohling, K.M. Young, D.A. Moniot, B.S. Felker, and A.G. Gilicinski, "Vapor Phase Cleaning of Sodium from Silicon Surfaces," American Vacuum Society 43rd National Symposium, Philadelphia, PA, October 1996.

M.A. George, S.E. Beck, K. Young, D.A. Moniot, D.A. Bohling, and D.W. Hess, "Chemical Vapor Cleaning of Transition Metals from Wafer Surfaces by 1,1,1,5,5,5-Hexafluoro-2,4-Pentanedione," American Vacuum Society 42nd National Symposium, Minneapolis, MN, October 1995.

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