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319 Windsong Dr • Greenville, SC 29615 daniel.moniot@mindspring.com • Phone (864) 223-2888x4403 • Fax (864) 223-0272 Research Technician     January 1995 - December 1998 · Researched applications of chelation chemistry related to semiconductor processing  · Developed vapor phase cleaning process for copper CVD reaction chambers  · Investigated vapor cleaning of trace ppm level metal contaminants from silicon surfaces using chelation chemistry under a $1.53 million DARPA research program · Addressed adhesion of chemical vapor deposited (CVD) copper to barrier layers · Conducted experiments determining cleaning effect on electrical characteristics of silicon surfaces · Received supervisor award for extraordinary project execution efforts · Developed aqueous metal doping method for contaminating wafers to produce surfaces similar to the IC industry · Processed metal oxide semiconductor (MOS) capacitors from silicon wafers in a Class 100 cleanroom · Constructed and maintained vacuum systems · Familiar with chemical handling, inventory and management · Designed, built, and maintained databases tracking samples, equipment, and purchases
Dent Manufacturing, Inc.
Moravian College
Chemistry Tutor     September 1991 - May 1993
Stockroom Assistant     September 1990 - May 1991
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