(2) S.E. Beck, M.A. George, D.A. Bohling, E.A. Robertson III, D.A. Moniot, A.J. Kobar, and J.L. Waskiewicz, "Vapor Phase Cleaning with b-Diketones," in 1998 Proceedings - Institute of Environmental Sciences and Technology, (The Institute of Environmental Sciences and Technology, Mount Prospect, IL, 1998).p. 80.
(3) S.E. Beck, E.A. Robertson III, M.A. George, D.A. Moniot, J.L. Waskiewicz, D.A. Bohling, K.M. Young, and A.A. Badowski, "Vapor Phase Cleaning of Cu, Fe, and Na from Wafer Surfaces using 1,1,1,5,5,5-Hexafluor-2,4-Pentanedione," in Cleaning Technology in Semiconductor Device Manufacturing V, edited by J. Ruzyllo and R.E. Novak, (Electrochemical Society Proceedings, vol. 97-35, 1998) p. 336.
(4) M.A. George, S.E. Beck, D.A Moniot, K.M. Young, D.A. Bohling, and D.W. Hess, "The Chemistry of Chemical Vapor Cleaning of Fe with the Chelating Ligand 1,1,1,5,5,5-Hexafluor-2,4-Pentanedione (H+hfac)," in Structure and Evolution of Surfaces, edited by R.C. Cammarata, E.H. Chason, T.L. Einstein, and E.D. Williams, (Mater. Res. Soc. Proc., vol. 440, Pittsburgh, PA, 1998) p. 443.
(5) A.G. Gilicinski, S.E. Beck, R.M. Rynders, and D.A. Moniot, "AFM Methodology for the Measurement of Silicon Wafer Microroughness," in Structure and Evolution of Surfaces, edited by R.C. Cammarata, E.H. Chason, T.L. Einstein, and E.D. Williams, (Mater. Res. Soc. Proc., vol. 440, Pittsburgh, PA, 1998) p. 83.
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