Presentation Outline: Empirical Process Correlation
Objective and application
- A compact model with process variable as input.
- A quick and reliable aid to technology developers.
- Reducing wafer split-lot with a carefully designed experiment.
- Statistical process fluctuation analysis and monitoring.
Wafer-split experiment (wafers #17, #18, #15, #19)
- Vt-adjustment implant dose: F = 0, 1, 2.5, 4?1012 cm-2.
Empirical correlation
- Calibrate (extract) the compact model with wafer #15.
- Correlate Nch to F through long-channel Vt0(Vbs) data.
- Correlate Is0 to F through long-channel Ioff data.
Performance prediction
- Predict Vt, Ion, and Ioff for the full range of Ldrawn of the wafer split-lots.