The Virtual Wafer Fab Technology for the Deep-Submicron ULSI Era

28-Oct-98

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Table of Contents

The Virtual Wafer Fab Technology for the Deep-Submicron ULSI Era

The ULSI Era: Technology Scaling

PPT Slide

VLSI Design and Manufacturing Hierarchy

Multi-Level Representation

Layout + Process = Chip

New Technology Development

The Microelectronics Industry

Chip Design and Wafer Fabrication (Design–Manufacturing–Characterization–Simulation–Verification)

Virtual Wafer Fab

Project DOUST

Major Objectives

Three Major Goals

Overall Planning

Multi-Variable Design Space Multi-Target Optimization

Process and Device Database

Projection and Contour Plots

Conceptual Database

Conceptual Framework

Methodology of Implementation

Threshold Model Based on TCAD

Research ? Development ? Application

Summary: Strategic Factors

Author: Xing Zhou 

Email: exzhou@ntu.edu.sg 

Home Page: http://www.ntu.edu.sg/home/exzhou/Research/DOUST/intro.htm